a) Outside Vapor Phase Oxidation (OVPO)
b) Vapor Axial Deposition (VAD)
c) Modified Chemical Vapor Deposition (MCVD)
d) Plasma-activated Chemical Vapor Deposition (PCVD)
_________ is the stimulation of oxide formation by means of non-isothermal plasma maintained at low pressure in a microw
-
answerhappygod
- Site Admin
- Posts: 899604
- Joined: Mon Aug 02, 2021 8:13 am
_________ is the stimulation of oxide formation by means of non-isothermal plasma maintained at low pressure in a microw
Join a community of subject matter experts. Register for FREE to view solutions, replies, and use search function. Request answer by replying!