-A silicon diode is fabricated by starting with an n-type substrate (N = 10¹6 cm³), into which indium is diffused to for
Posted: Sat Jul 09, 2022 12:06 pm
-A silicon diode is fabricated by starting with an n-type substrate (N = 10¹6 cm³), into which indium is diffused to form as a p-type region doped at 10¹8 cm³. Assuming that an abrupt pt in junction is formed by the diffusion process. (20 marks) a. Calculate the Fermi level position in the p and n regions Determine the built in potential b. Calculate the depletion widths on the p and n side.