cess and can be ignored. ***5.3.5 One of the most common commercial methods for the production of pure sili- con that is

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Cess And Can Be Ignored 5 3 5 One Of The Most Common Commercial Methods For The Production Of Pure Sili Con That Is 1 (62.89 KiB) Viewed 14 times

cess and can be ignored. ***5.3.5 One of the most common commercial methods for the production of pure sili- con that is to be used for the manufacture of semiconductors is the Siemens process (see Figure P5.3.5) of chemical vapor deposition (CVD). A chamber contains a heated silicon rod and a mixture of high-purity trichlorosilane mixed with high-purity hydrogen that is passed over the rod. Pure silicon (EGS electronic grade silicon) deposits on the rod as a polycrystalline solid. (Single crystals of Si are later made by subsequently melting the EGS and drawing a single crystal from the melt.) The reaction is H₂(g) + SiHCl3(g) → Si(s) + 3HCl(g) The rod initially has a mass of 1460 g, and the mole fraction of H₂ in the exit gas is 0.223. The mole fraction of H₂ in the feed to the reactor is 0.580, and the feed enters at the rate of 6.22 kg mol/hr. What will be the mass of the rod at the end of 20 min? H₂(g) + SiHCl3(g) → Si(s) + 3HCl(g) 1200° C Gas Rod SiHCl3 H₂ Gas HCI SiHCl3 H₂ Figure P5.3.5mtra terW