- 4 Plot Resolution And Depth Of Field As A Function Of Exposure Wavelength For A Projection Aligner With 100 Nm 500 1 (16.21 KiB) Viewed 40 times
4. Plot resolution and depth of field as a function of exposure wavelength for a projection aligner with 100 nm ≤ ≤ 500
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4. Plot resolution and depth of field as a function of exposure wavelength for a projection aligner with 100 nm ≤ ≤ 500
4. Plot resolution and depth of field as a function of exposure wavelength for a projection aligner with 100 nm ≤ ≤ 500 nm. Use k = 0.75 and NA = 0.26. On the same plots, recalculate these functions for NA-0.41. Discuss the implications of these plots for the technologist than must manufacture transistors with 0.5-μm features.
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