In semiconductor manufacturing, an important fabrication step is photolithography, in which a light-sensitive photoresis

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In semiconductor manufacturing, an important fabrication step is
photolithography, in which a light-sensitive photoresist material
is applied to the silicon wafer, the circuit pattern is exposed on
the resist typically through the use of high-intensity UV light,
and the unwanted resist material is removed through a developing
process. An important quality characteristic in the hard bake
process is resist flow width which is a measure of how much it
expands due to the baking process. Suppose that flow width can be
controlled at a mean of 1.5 microns, and a known standard deviation
of 0.15 microns for the overall population. A random sample of 5
wafers has an average flow width of 1.63 microns. The process
quality analyst has calculated a test statistic with a value of
1.93 to test the following hypothesis: H0: μ=1.5, H1: μ>1.5
Calculate the P-value for this test with 4 decimal
places.