b) The sub-threshold ID-Vas curves of a MOSFET are shown in the Figure below before and after stressing the device. Dete
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b) The sub-threshold ID-Vas curves of a MOSFET are shown in the Figure below before and after stressing the device. Dete
b) The sub-threshold ID-Vas curves of a MOSFET are shown in the Figure below before and after stressing the device. Determine the interface trap density change AD (in cm2 eV) induced by the stress. T=300 C K, Kox= 3.9, fax = 10 nm. Known: AD=- (Saper-Shefore) In(10)qkT 104 Before ID (A) 10-6 10 10-10 10-12 hou have ha 0 0.5 After stress VGS (V) 1.5
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