How a uniform film with good crystal structure is attained in cathode sputtering process?
Posted: Thu Jul 14, 2022 10:01 am
a) By hitting high energy particle directly on the substrate
b) Allowing Less time for the particles to deposit on the substrate
c) High energy particle diffuse through low pressure gas and deposits on the substrate
d) Heavy inert gas is used for film deposition on the substrate
b) Allowing Less time for the particles to deposit on the substrate
c) High energy particle diffuse through low pressure gas and deposits on the substrate
d) Heavy inert gas is used for film deposition on the substrate