Problem 3: MEMS materials and processes (30 points) a) The following figure shows the deposition rate of CVD as related
Posted: Wed Mar 30, 2022 10:02 am
Problem 3: MEMS materials and processes (30 points) a) The following figure shows the deposition rate of CVD as related to the process temperature. It is divided into two regions (A&B) according to the rate-limiting factor. Which region (A&B) is limited by what factor? What is the effect of temperature and gas flow rate? (10 points) TEMPERATURE (°C) 1300 1200 100 1000 900 800 600 0.5+ Bus OSHA SiH2 CH2 ASIHCly 021 Osica 700 ION GROWTH RATE (m/min) o os ܓܦܬܐ 02- للاره 08 0.9 10/T(K) 10 Figure: Plot showing CVD deposition rate regimes