a) By hitting high energy particle directly on the substrate
b) Allowing Less time for the particles to deposit on the substrate
c) High energy particle diffuse through low pressure gas and deposits on the substrate
d) Heavy inert gas is used for film deposition on the substrate
How a uniform film with good crystal structure is attained in cathode sputtering process?
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How a uniform film with good crystal structure is attained in cathode sputtering process?
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